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10 April 2024 Vapor-phase infiltration (VPI) / sequential infiltration synthesis (SIS) for advanced patterning applications
Chang-Yong Nam
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Proceedings Volume PC12956, Novel Patterning Technologies 2024; PC129560U (2024) https://doi.org/10.1117/12.3010072
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States
Abstract
Vapor-phase infiltration (VPI), also known as sequential infiltration synthesis (SIS), utilizes sequential and cyclic infiltration of gaseous organometallic precursors and¬ co-reactants into the matrix of organic templates to form inorganic-infused organic-inorganic hybrids that feature uniquely modified material composition, properties, and structures. In this talk, I will highlight our recent efforts on employing VPI of metal oxides for novel patterning applications based on various polymeric templates, such as self-assembled block copolymers (BCPs) and photoresists. Precursor-polymer reaction chemistry will be overviewed in relation to infiltration fidelity, area selectivity, material distribution, and volume expansion, which can have impacts on target patterning applications, including BCP-based metal oxide nanostructure patterning and the vapor-phase synthesis of hybrid extreme ultraviolet (EUV) photoresists.
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Chang-Yong Nam "Vapor-phase infiltration (VPI) / sequential infiltration synthesis (SIS) for advanced patterning applications", Proc. SPIE PC12956, Novel Patterning Technologies 2024, PC129560U (10 April 2024); https://doi.org/10.1117/12.3010072
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KEYWORDS
Advanced patterning
Optical lithography
Block copolymers
Metal oxides
Photoresist materials
Extreme ultraviolet lithography
Materials properties
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