Three-color lithography for high resolution fabrication

Nicholas C. Fisher; Shuhei Yamaguchi; Sandra A. Gutierrez Razo; Nikolaos Liaros; Andrea N. Zeppuhar; Daniel E. Falvey; John S. Petersen; John T. Fourkas

doi:10.1117/12.3010863

10 April 2024 Three-color lithography for high resolution fabrication

Nicholas C. Fisher, Shuhei Yamaguchi, Sandra A. Gutierrez Razo, Nikolaos Liaros, Andrea N. Zeppuhar, Daniel E. Falvey, John S. Petersen, John T. Fourkas

Author Affiliations +

Proceedings Volume PC12956, Novel Patterning Technologies 2024; PC129560Z (2024) https://doi.org/10.1117/12.3010863
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Conference Poster

Abstract

Three-color lithography (3CL) is a technique for fabricating high-resolution nanopatterns using visible light. This technique has been benchmarked in one promising photoresist by fabricating arrays of posts in a three-color material. The smallest posts are ~130nm in diameter, and the best pitches are around 180nm. If the 3CL deactivation step is not used, any features that are fabricated this close together merge due to proximity effects. The benefit of 3CL over other techniques, such as multi-patterning and extreme UV lithography, is that 3CL uses inexpensive optics and light sources, and the setup is simpler because high vacuum is not necessary.

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Nicholas C. Fisher, Shuhei Yamaguchi, Sandra A. Gutierrez Razo, Nikolaos Liaros, Andrea N. Zeppuhar, Daniel E. Falvey, John S. Petersen, and John T. Fourkas "Three-color lithography for high resolution fabrication", Proc. SPIE PC12956, Novel Patterning Technologies 2024, PC129560Z (10 April 2024); https://doi.org/10.1117/12.3010863

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