Control of debris production of laser plasma sources with high-average XUV power

Fred Bijkerk; Eric Louis; Leonid A. Shmaenok; Harm-Jan Voorma; Marnix J. van der Wiel; I. C. Edmond Turcu; Gregory J. Tallents

doi:10.1117/12.147395

24 June 1993 Control of debris production of laser plasma sources with high-average XUV power

Fred Bijkerk, Eric Louis, Leonid A. Shmaenok, Harm-Jan Voorma, Marnix J. van der Wiel, I. C. Edmond Turcu, Gregory J. Tallents

Author Affiliations +

Proceedings Volume 1848, 24th Annual Boulder Damage Symposium Proceedings -- Laser-Induced Damage in Optical Materials: 1992; (1993) https://doi.org/10.1117/12.147395
Event: Optical Materials for High Power Lasers, 1992, Boulder, CO, United States

Abstract

Recent investigations on methods to eliminate the contamination of high power laser plasma sources are reviewed. The use of separate methods such as a buffer gas environment or thin tape targets suppresses the debris yield drastically up to a factor of 10³. A combination of this with other effective as well as practically convenient methods (use of debris angular characteristics, a rotating shutter, or thin UV filters) provides a truly contamination-free XUV source. As an example of a novel high power source we describe the performance of a 1.5 J KrF laser designed to drive a laser plasma XUV source. The laser was used to generate narrowband XUV radiation at 18 nm. A conversion efficiency of >= 1.4% in a bandwidth of 6% was measured, demonstrating the feasibility of laser plasma sources for applications such as XUV projection lithography, requiring high average power.

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Fred Bijkerk, Eric Louis, Leonid A. Shmaenok, Harm-Jan Voorma, Marnix J. van der Wiel, I. C. Edmond Turcu, and Gregory J. Tallents "Control of debris production of laser plasma sources with high-average XUV power", Proc. SPIE 1848, 24th Annual Boulder Damage Symposium Proceedings -- Laser-Induced Damage in Optical Materials: 1992, (24 June 1993); https://doi.org/10.1117/12.147395

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