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Proceedings Article

Computerized interferometric measurement of surface microstructure

[+] Author Affiliations
James C. Wyant

WYKO Corp. and Optical Sciences Ctr./Univ. of Arizona (USA)

Proc. SPIE 2576, International Conference on Optical Fabrication and Testing, 122 (August 2, 1995); doi:10.1117/12.215586
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From Conference Volume 2576

  • International Conference on Optical Fabrication and Testing
  • Toshio Kasai
  • Tokyo, Japan | June 05, 1995

abstract

Nearly all modern high-quality measuring instruments now use micro computers for the collection and analysis of data. This paper describes a computerized interferometric microscope system for the measurement of surface microstructure. For the instrument described in this paper the surface microstructure can be measured at data array sizes as large as 739 X 484 points for measurement fields ranging from 30 X 25 microns to 8.2 X 6.1 mm. A repeatability of the surface height measurements of less than 0.1 nm can be obtained for smooth surfaces. Surfaces having height variances as large as 500 microns can be measured to within an accuracy of a few nanometers.

© (1995) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

James C. Wyant
"Computerized interferometric measurement of surface microstructure", Proc. SPIE 2576, International Conference on Optical Fabrication and Testing, 122 (August 2, 1995); doi:10.1117/12.215586; http://dx.doi.org/10.1117/12.215586


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