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Proceedings Article

Manufacturing performance of the ALTA 3000 mask laser writer

[+] Author Affiliations
Brian J. Grenon, D. C. Defibaugh, Donna M. Sprout, C. J. Taft

IBM Microelectronics (USA)

Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, 14 (October 6, 1995); doi:10.1117/12.228180
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From Conference Volume 2621

  • 15th Annual BACUS Symposium on Photomask Technology and Management
  • Gilbert V. Shelden; James N. Wiley
  • Santa Clara, CA | September 20, 1995

abstract

This paper describes the manufacturing performance of the ALTA 3000 laser writer at the IBM mask fabrication facility in Essex Junction, Vermont. Current mask parametric performance for feature size control (x-bar and 3-sigma), registration and defect density of 4x and 5x reticles is presented. In addition, reliability data and write-time data for typical 64 Mb and 256 Mb reticles are provided.

© (1995) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Brian J. Grenon ; D. C. Defibaugh ; Donna M. Sprout and C. J. Taft
"Manufacturing performance of the ALTA 3000 mask laser writer", Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, 14 (October 6, 1995); doi:10.1117/12.228180; http://dx.doi.org/10.1117/12.228180


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