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Proceedings Article

Photomask production integration of KLA STARlight 300 system

[+] Author Affiliations
Franklin D. Kalk, David Mentzer

DuPont Photomasks, Inc. (USA)

Anthony Vacca

KLA Instruments, Inc. (USA)

Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, 112 (October 6, 1995); doi:10.1117/12.228162
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From Conference Volume 2621

  • 15th Annual BACUS Symposium on Photomask Technology and Management
  • Gilbert V. Shelden; James N. Wiley
  • Santa Clara, CA | September 20, 1995

abstract

This paper describes the use of the KLA STARlightTM 300 inspection system for advanced photomask manufacturing and development. STARlight's combination of state-of- the-art defect detectivity and high speed helps to streamline final mask inspection and improve product quality. For advanced development, previously undetected defects can now be identified, their effects on printability can be quantified, and strategies to eliminate them can be implemented.

© (1995) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Franklin D. Kalk ; David Mentzer and Anthony Vacca
"Photomask production integration of KLA STARlight 300 system", Proc. SPIE 2621, 15th Annual BACUS Symposium on Photomask Technology and Management, 112 (October 6, 1995); doi:10.1117/12.228162; http://dx.doi.org/10.1117/12.228162


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