Practical consequences of matching real laser sources to target illumination requirements

Glenn Ogura; Rod Andrew; Ronald D. Schaeffer

doi:10.1117/12.237757

8 April 1996 Practical consequences of matching real laser sources to target illumination requirements

Glenn Ogura, Rod Andrew, Ronald D. Schaeffer

Proceedings Volume 2703, Lasers as Tools for Manufacturing of Durable Goods and Microelectronics; (1996) https://doi.org/10.1117/12.237757
Event: Photonics West '96, 1996, San Jose, CA, United States

Abstract

UV laser processing as an industrial production step generally requires the beam illumination of target or mask to be of well-defined resolution, intensity and uniformity, and above all reproducible over long periods of time. Real excimer laser sources, despite major improvements over recent years, still deliver beams of non-uniform intensity profile with different beam divergence in each axis. This paper deals with practical approaches to excimer laser energy control, beam shaping and beam homogenization, and the matching of beam illumination optics to projection imaging optics.

Citation Download Citation

Glenn Ogura, Rod Andrew, and Ronald D. Schaeffer "Practical consequences of matching real laser sources to target illumination requirements", Proc. SPIE 2703, Lasers as Tools for Manufacturing of Durable Goods and Microelectronics, (8 April 1996); https://doi.org/10.1117/12.237757

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