Nanometer-scale dimensional metrology with noncontact atomic force microscopy

Herschel M. Marchman

doi:10.1117/12.240110

21 May 1996 Nanometer-scale dimensional metrology with noncontact atomic force microscopy

Herschel M. Marchman

Proceedings Volume 2725, Metrology, Inspection, and Process Control for Microlithography X; (1996) https://doi.org/10.1117/12.240110
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

Results from an extensive performance study on a noncontact scanning mode atomic fore microscope (AFM) are presented. The application of AFM to complement in-line CD metrology SEMs also is described.

Citation Download Citation

Herschel M. Marchman "Nanometer-scale dimensional metrology with noncontact atomic force microscopy", Proc. SPIE 2725, Metrology, Inspection, and Process Control for Microlithography X, (21 May 1996); https://doi.org/10.1117/12.240110

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