The performance of UV photolithography lens-systems with usually several ten optical components is limited by both the quality of the substrates and by the quality of the optical coatings. The key problems are the quality of the reflectance over large and strongly curved surfaces, the absorption and scatter losses and the behavior during heavy UV irradiation in production lines.
© (1996) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Harry H. Bauer ; Matthias Heller and Norbert Kaiser
Optical coatings for UV photolithography systems
", Proc. SPIE 2776, Developments in Optical Component Coatings, 353 (August 19, 1996); doi:10.1117/12.246823; http://dx.doi.org/10.1117/12.246823