In-situ growth control of x-ray multilayers using visible light kinetic ellipsometry and grazing incidence x-ray reflectometry

Eike Luken; Eric Ziegler; Manohar Lingham

doi:10.1117/12.246194

16 August 1996 In-situ growth control of x-ray multilayers using visible light kinetic ellipsometry and grazing incidence x-ray reflectometry

Eike Luken, Eric Ziegler, Manohar Lingham

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Proceedings Volume 2873, International Symposium on Polarization Analysis and Applications to Device Technology; (1996) https://doi.org/10.1117/12.246194
Event: International Symposium on Polarization Analysis and Applications to Device Technology, 1996, Yokohama, Japan

Abstract

The manufacturing of x-ray multilayers calls for a precise control of layers having individual thicknesses in the nanometer range and with minimum diffusion at the interfaces. Visible light kinetic ellipsometry and grazing incidence hard x-ray reflectometry (8 keV) have been used under a plasma sputtering environment. The growth of W/Si multilayers illustrates the capabilities of both methods. Thickness, density and roughness values have been derived for each layer by simulation of the experimental data. Those values fit very well the grazing x-ray reflectivity data obtained on the final multilayer exposed to the atmosphere, except for the last 2 layers as a result of oxidation.

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Eike Luken, Eric Ziegler, and Manohar Lingham "In-situ growth control of x-ray multilayers using visible light kinetic ellipsometry and grazing incidence x-ray reflectometry", Proc. SPIE 2873, International Symposium on Polarization Analysis and Applications to Device Technology, (16 August 1996); https://doi.org/10.1117/12.246194

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