Heat transfer from localized absorbing defects to the host coating material in HfO2/SiO2 multilayer systems

Semyon Papernov; Ansgar W. Schmid

doi:10.1117/12.274258

13 May 1997 Heat transfer from localized absorbing defects to the host coating material in HfO2/SiO2 multilayer systems

Semyon Papernov, Ansgar W. Schmid

Proceedings Volume 2966, Laser-Induced Damage in Optical Materials: 1996; (1997) https://doi.org/10.1117/12.274258
Event: Laser-Induced Damage in Optical Materials: 1996, 1996, Boulder, CO, United States

Abstract

Finite-element analysis was applied in calculating the heat- transfer effects from localized absorbing defects to the host coating material in multilayer HfO₂/SiO₂ system, irradiated by 1-ns pulses. Thermoconductivity was considered the major heat-transfer mechanism. A comparison with high-resolution laser-damage morphology studies carried out by means of atomic-force microscopy allowed estimating peak temperatures reached by the absorbing defects. These peak-temperature values as well as the lateral length scales of the empirically found laser-damage features point toward the importance of radiative energy transfer from the heated defect as the driving mechanism of laser-damage initiation.

Citation Download Citation

Semyon Papernov and Ansgar W. Schmid "Heat transfer from localized absorbing defects to the host coating material in HfO2/SiO2 multilayer systems", Proc. SPIE 2966, Laser-Induced Damage in Optical Materials: 1996, (13 May 1997); https://doi.org/10.1117/12.274258

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