Thin Film Oxides Of Vanadium, Niobium, And Tantalum For Integrated Optics

Richard L. Davis; Fred S. Hickernell

doi:10.1117/12.935702

30 November 1983 Thin Film Oxides Of Vanadium, Niobium, And Tantalum For Integrated Optics

Richard L. Davis, Fred S. Hickernell

Proceedings Volume 0408, Integrated Optics III; (1983) https://doi.org/10.1117/12.935702
Event: 1983 Technical Symposium East, 1983, Arlington, United States

Abstract

Thin films of V2O5, Nb2O5, and Ta2O5 have been grown under a variety of conditions including reactive rf sputtering, reactive bias sputtering, and post deposition oxidation. The refractive index and guided-wave attenuation have been measured for both as-grown and annealed films. Except for V205, where low losses were not achieved, general guidelines were established for optimal growth conditions resulting in high refractive index low loss films. Films of Nb2O5 and Ta2O5 have been used in the fabrication of guided wave Bragg cells and waveauidp Lunphura lenses.

Citation Download Citation

Richard L. Davis and Fred S. Hickernell "Thin Film Oxides Of Vanadium, Niobium, And Tantalum For Integrated Optics", Proc. SPIE 0408, Integrated Optics III, (30 November 1983); https://doi.org/10.1117/12.935702

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