Paper
3 September 1985 Application Of IR Ellipsometry/Reflectometry To Surface Metrology
Thomas A. Leonard, John S. Loomis, Jack B. Stubbs
Author Affiliations +
Proceedings Volume 0525, Measurement and Effects of Surface Defects & Quality of Polish; (1985) https://doi.org/10.1117/12.946353
Event: 1985 Los Angeles Technical Symposium, 1985, Los Angeles, United States
Abstract
Comparison of ellipsometric and reflectance measurements provides information on the amount of Total Integrated Scatter (TIS) when the surface model is reasonably well known. This is possible because the ellipsometric data are not strongly affected by scattering whereas the measured reflectance is reduced below the "model based" value by an amount equal to the TIS. The ellipsometric data provide the information necessary to correctly fit the model parameters (n and k). This procedure is discussed and a combined ellipsometer/reflectometer is described. Results of measurements on a metal surface are presented.
© (1985) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Thomas A. Leonard, John S. Loomis, and Jack B. Stubbs "Application Of IR Ellipsometry/Reflectometry To Surface Metrology", Proc. SPIE 0525, Measurement and Effects of Surface Defects & Quality of Polish, (3 September 1985); https://doi.org/10.1117/12.946353
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KEYWORDS
Data modeling

Reflectivity

Mirrors

Metals

Phase shifts

Polarizers

Reflectometry

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