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Proceedings Article

A Concept For A High Resolution Optical Lithographic System For Producing One-Half Micron Linewidths

[+] Author Affiliations
George O. Reynolds

Honeywell Electro-Optics Division (United States)

Proc. SPIE 0633, Optical Microlithography V, 228 (August 20, 1986); doi:10.1117/12.963726
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From Conference Volume 0633

  • Optical Microlithography V
  • Harry L. Stover
  • Santa Clara | March 10, 1986

abstract

This paper describes a concept for developing an optical printer having a one-half micron linewidth capability to meet the pro-jected needs of future Integrated Circuit (IC) production facilities. Our approach for meeting this objective is to combine the appro-priate features of the current 1:1 reflective optical printers with the stepping characteristic of the 10:1 refractive optical systems. The proposed, very deep, UV step and repeat system has the potential of reaching a one-half micron linewidth production goal entirely with optical technology. The key subsystem elements necessary to achieve these goals are discussed. These subsystems include a reflective optical system, a 10:1 stepper configuration having a linearity limit of 0.5 microns and an FOV of 15 mm, a deep UV laser source, photoresists having the required sensitivity, an alignment capability of 500 Å , a focal sensor having a 500 Å tolerance and the associated mechanical, electronic and environmental controls compatible with a produc-tion throughput of 60-four inch wafers/hour.

© (1986) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

George O. Reynolds
"A Concept For A High Resolution Optical Lithographic System For Producing One-Half Micron Linewidths", Proc. SPIE 0633, Optical Microlithography V, 228 (August 20, 1986); doi:10.1117/12.963726; http://dx.doi.org/10.1117/12.963726


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