Simulation Of Proximity Printing

K. I. Arshak; N. N. Kundu; S. N. Gupta

doi:10.1117/12.968420

1 January 1988 Simulation Of Proximity Printing

K. I. Arshak, N. N. Kundu, S. N. Gupta

Proceedings Volume 0922, Optical/Laser Microlithography; (1988) https://doi.org/10.1117/12.968420
Event: Santa Clara Symposium on Microlithography, 1988, Santa Clara, CA, United States

Abstract

Proximity Printing is a simple, high throughput non-contact method for wafer exposure. Image quality of such a system is limited by the diffraction of light at the edges of object. This causes exposure variation in resist and hence image distortion. Proximity printing process has been simulated for lithography purpose. Computations were done for an array of apertures. Aperture separation and aperture to substrate gap have been varied to see the effect on image intensity distributions. Some experiments were done using Cobilt aligner in proximity mode. Microphotographs of resist image were taken & compared with the 3D Plot of computed results. Good agreement is observed.

Citation Download Citation

K. I. Arshak, N. N. Kundu, and S. N. Gupta "Simulation Of Proximity Printing", Proc. SPIE 0922, Optical/Laser Microlithography, (1 January 1988); https://doi.org/10.1117/12.968420

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