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Proceedings Article

The Plasma Focus As Soft X-Ray Source For Microscopy And Lithography

[+] Author Affiliations
W. Neff, J Eberle, R. Holz, F. Richter

Fraunhofer Institut fur Lasertechnik (Germany)

R. Lebert

RWTH Lehrstuhl fur Lasertechnik (Germany)

Proc. SPIE 1140, X-Ray Instrumentation in Medicine and Biology, Plasma Physics, Astrophysics, and Synchrotron Radiation, 13 (November 27, 1989); doi:10.1117/12.961796
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From Conference Volume 1140

  • X-Ray Instrumentation in Medicine and Biology, Plasma Physics, Astrophysics, and Synchrotron Radiation
  • Rene Benattar
  • Paris, France | April 24, 1989

abstract

Plaafocs devices producing small volume of plasma with electron density ne ≈ 1020 cm-3 and mean particle energy of about 1 keV seem to meet the requirements for compact X-ray sources for industrial use. Their emission properties can be taylored for X-ray microscopy where narrowband emission with high spectral brilliance in the water window (2.4 nm to 4.3 nm) is required, as well as for X-ray lithography demanding for high mean power in the wavelength region from 0.7 nm to 1.0 nm. For X-ray microscopy the emission of Lyman-a lines is of advantage whereas for X-ray lithography the broadband continuum and line radiation can be used. For X-ray microscopy a single pulse source using the is - 2p line of nitrogen VII at 2.48 nm and for X-ray lithography a source running with several Hz repetition rate using the emission of hydrogen- and heliumlike neon ions around 1 nm are being developed.

© (1989) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

W. Neff ; J Eberle ; R. Holz ; R. Lebert and F. Richter
"The Plasma Focus As Soft X-Ray Source For Microscopy And Lithography", Proc. SPIE 1140, X-Ray Instrumentation in Medicine and Biology, Plasma Physics, Astrophysics, and Synchrotron Radiation, 13 (November 27, 1989); doi:10.1117/12.961796; http://dx.doi.org/10.1117/12.961796


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