Characterization Of Optical Baffle Materials

A. Lompado; B. W. Murray; J. S. Wollam; J. F. Meroth

doi:10.1117/12.962851

2 January 1990 Characterization Of Optical Baffle Materials

A. Lompado, B. W. Murray, J. S. Wollam, J. F. Meroth

Proceedings Volume 1165, Scatter from Optical Components; (1990) https://doi.org/10.1117/12.962851
Event: 33rd Annual Technical Symposium, 1989, San Diego, United States

Abstract

Optical baffle materials will play a critical role in meeting specifications for off-axis stray light rejection and contamination control for a number of planned space-based telescopes. Spire has been developing new baffle materials to meet those specifications. The purpose of this paper is to present the results of optical scatter and reflectance measurements for a number of currently available baffle materials and some new baffle materials developed at Spire [1]. Bidirectional reflectance distribution function (BRDF) measurements were performed in a fully automated, in-air scatterometer at two wavelengths, 632.8 nm and 10.6 microns [2]. BRDF data is presented as in-plane and out-of-plane scans over a direction cosine range of + 0.8. Total hemispherical reflectance (THR) measurements were carried out using a semi-automated spectrophotometer with an integrating sphere over a bandwidth of 400 nm to 1000 nm using a Xenon arc lamp as the source and at 3.39 microns and 10.6 microns using laser sources. A discussion of the performance of these optical baffles will be presented based on the BRDF and THR data, and scanning electron microscope (SEM) micrographs of the baffle surfaces.

Citation Download Citation

A. Lompado, B. W. Murray, J. S. Wollam, and J. F. Meroth "Characterization Of Optical Baffle Materials", Proc. SPIE 1165, Scatter from Optical Components, (2 January 1990); https://doi.org/10.1117/12.962851

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