Polarization Micro-Metrology

Lionel R. Baker

doi:10.1117/12.962890

25 January 1990 Polarization Micro-Metrology

Lionel R. Baker

Proceedings Volume 1166, Polarization Considerations for Optical Systems II; (1990) https://doi.org/10.1117/12.962890
Event: 33rd Annual Technical Symposium, 1989, San Diego, United States

Abstract

The precise measurement of micro-images in the fields of surface topography, integrated circuit inspection and microscopy, requires optical sensors and attenuators with wide dynamic range. Polarization techniques with these qualities have long been used in the fields of ellipsometry and polarimetry. This paper describes the use of polarization in a two-channel null microphotometer to quantify various aspects of surface texture such as flaws, waviness and roughness. Recently obtained resultS on the measurement of micro-height variations, texture, line widths and edge location will be presented to illustrate the wide range of metrology possible with this technique.

Citation Download Citation

Lionel R. Baker "Polarization Micro-Metrology", Proc. SPIE 1166, Polarization Considerations for Optical Systems II, (25 January 1990); https://doi.org/10.1117/12.962890

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