Optomechanical design of ultrahigh-resolution monochromator and analyzer for inelastic x-ray scattering spectrometer at the advanced photon source

D. Shu; S. Stoupin; R. Khachatryan; K. Goetze; T. Roberts; Yu. Shvyd'ko

doi:10.1117/12.894103

24 September 2011 Optomechanical design of ultrahigh-resolution monochromator and analyzer for inelastic x-ray scattering spectrometer at the advanced photon source

D. Shu, S. Stoupin, R. Khachatryan, K. Goetze, T. Roberts, Yu. Shvyd'ko

Author Affiliations +

Proceedings Volume 8125, Optomechanics 2011: Innovations and Solutions; 812507 (2011) https://doi.org/10.1117/12.894103
Event: SPIE Optical Engineering + Applications, 2011, San Diego, California, United States

Abstract

A prototype of a novel ultrahigh-resolution inelastic x-ray scattering spectrometer has been designed and tested at undulator-based beamline 30-ID, at the Advanced Photon Source (APS), Argonne National Laboratory. This state-of-the-art instrument is designed to meet challenging mechanical and optical specifications for producing ultrahigh-resolution inelastic x-ray scattering spectroscopy data for various scientific applications. The optomechanical design of the ultrahigh-resolution monochromator and analyzer for inelastic x-ray scattering spectrometer as well as the preliminary test results of its precision positioning performance are presented in this paper.

Citation Download Citation

D. Shu, S. Stoupin, R. Khachatryan, K. Goetze, T. Roberts, and Yu. Shvyd'ko "Optomechanical design of ultrahigh-resolution monochromator and analyzer for inelastic x-ray scattering spectrometer at the advanced photon source", Proc. SPIE 8125, Optomechanics 2011: Innovations and Solutions, 812507 (24 September 2011); https://doi.org/10.1117/12.894103

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