A new source optimization approach for 2X node logic

Kazuya Iwase; Peter De Bisschop; Bart Laenens; Zhipan Li; Keith Gronlund; Paul van Adrichem; Stephen Hsu

doi:10.1117/12.898749

13 October 2011 A new source optimization approach for 2X node logic

Kazuya Iwase, Peter De Bisschop, Bart Laenens, Zhipan Li, Keith Gronlund, Paul van Adrichem, Stephen Hsu

Proceedings Volume 8166, Photomask Technology 2011; 81662A (2011) https://doi.org/10.1117/12.898749
Event: SPIE Photomask Technology, 2011, Monterey, California, United States

Abstract

Source mask optimization (SMO) and double patterning technology (DPT) are considered key Resolution Enhancement Technique (RET) enablers for scaling 2x nodes and beyond design rules, using existing 193 nm ArF technology prior to EUV availability. SMO has been extensively shown to enlarge the process margin for critical layers in memory cells and test patterns; however the best SMO flow for a large random logic area up to full-chip application has been less explored. In this study, we investigated how the mask complexity in the source optimization impacts the final process window on a random logic layout after DPT, and proposed a new source optimization approach. Example used is a contact layer for 2x logic designs. The SMO source optimization is performed using the SRAM cells with different mask complexities. These optimized sources are then evaluated based on a large-area random logic layout after mask-only optimization. CD variation through process window is used as the metric for comparison. We found the best result is obtained when the source is optimized with the full flexibility of the source and mask with freeform SRAFs and minimal MRC constraints. The source optimized with this approach can reduce CD variation through process window in the random logic without increasing its mask complexity.

Citation Download Citation

Kazuya Iwase, Peter De Bisschop, Bart Laenens, Zhipan Li, Keith Gronlund, Paul van Adrichem, and Stephen Hsu "A new source optimization approach for 2X node logic", Proc. SPIE 8166, Photomask Technology 2011, 81662A (13 October 2011); https://doi.org/10.1117/12.898749

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available