Paper
23 January 2006 Modeling the fabrication of nano-optical structures
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Abstract
Over the last two decades, considerable research has been devoted to micro-optic and now nano-optical structures. Fabrication methods have become sufficiently mature to realize most concepts, but due to physics inherent in the process, geometry is distorted. Edges are rounded, sidewalls are sloped, surfaces are rough, and etching or deposition not uniform. Deviations from "perfect" geometry can dramatically affect optical behavior. In order to address the impact of the "non-perfect" nature of fabrication, numerical methods for modeling fabrication is discussed and quantified for various examples. As an example, comprehensive modeling of near-field nano-patterning is described. Numerical and experimental results are presented of three-dimensional photonic crystals fabricated in a contact mask aligner using a standard UV lamp as the source.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Raymond C. Rumpf, Pradeep Srinivasan, and Eric G. Johnson "Modeling the fabrication of nano-optical structures", Proc. SPIE 6110, Micromachining Technology for Micro-Optics and Nano-Optics IV, 611004 (23 January 2006); https://doi.org/10.1117/12.652604
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CITATIONS
Cited by 2 scholarly publications.
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KEYWORDS
Photoresist materials

Photonic crystals

3D modeling

Near field optics

Process modeling

Absorption

Near field

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