Paper
9 June 2006 Study of the optical properties of ZnO thin films prepared by laser molecular beam epitaxy
Zhongfeng Xu, Kairu Ju, Qing'an Xu
Author Affiliations +
Proceedings Volume 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 61491T (2006) https://doi.org/10.1117/12.674255
Event: 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2005, Xian, China
Abstract
ZnO thin films are prepared on sapphire (0001) substrate by laser molecular beam epitaxy (L-MBE) and the optical properties were studied. It is found that the growth conditions and the treat process have obvious effect on the optical properties of ZnO films. With the increase of the growth oxygen pressure, the concentration of the structural defects in ZnO films caused by the disbalance of Zn and O stoichiometric proportion is depressed effectively. As a result, the UV emission intensity grows much higher, but the deep level (DL) emission is depressed. Sample 1#, 2#, and 3# were grown at oxygen pressure 2.0E-3Pa, 8.0E-3Pa, 2.0E-2Pa respectively, and the ratio of the UV emission intensity and the DL emission intensity were 1.00, 2.34, 3.31 respectively. The effect of annealing treatment on the transmission spectra of ZnO films was also studied. Sample 1# was cut into three parts and annealed at 500oC, 600oC, 700oC respectively in the air atmosphere. The transmittivity in the visible range become much greater after annealing and the higher the annealing temperature is, the higher the transmittivity becomes. When annealed at 700oC, the transmittivity has nearly doubled.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Zhongfeng Xu, Kairu Ju, and Qing'an Xu "Study of the optical properties of ZnO thin films prepared by laser molecular beam epitaxy", Proc. SPIE 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 61491T (9 June 2006); https://doi.org/10.1117/12.674255
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KEYWORDS
Zinc oxide

Oxygen

Ultraviolet radiation

Annealing

Optical properties

Thin films

Molecular beam epitaxy

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