EUV wavefront metrology at EUVA

Chidane Ouchi; Seima Kato; Masanobu Hasegawa; Takayuki Hasegawa; Hideo Yokota; Katsumi Sugisaki; Masashi Okada; Katsuhiko Murakami; Jun Saito; Masahito Niibe; Mitsuo Takeda

doi:10.1117/12.656039

24 March 2006 EUV wavefront metrology at EUVA

Chidane Ouchi, Seima Kato, Masanobu Hasegawa, Takayuki Hasegawa, Hideo Yokota, Katsumi Sugisaki, Masashi Okada, Katsuhiko Murakami, Jun Saito, Masahito Niibe, Mitsuo Takeda

Author Affiliations +

Proceedings Volume 6152, Metrology, Inspection, and Process Control for Microlithography XX; 61522O (2006) https://doi.org/10.1117/12.656039
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

Precise measurements of the wavefront aberrations of projection optics with 0.1 nm RMS accuracy are indispensable to develop the extreme ultraviolet (EUV) lithography. In order to study measurement methods, we built the Experimental EUV Interferometer (EEI) that has built-in Schwarzschild-type optics as test optics and was supplied with EUV radiation of 13.5 nm in wavelength from a synchrotron radiation facility as a source light. The EEI can evaluate several methods of EUV interferometory replacing optical parts easily. Those methods are dividable into two categories, namely point diffraction interferometer (PDI) and lateral shearing interferometer (LSI) and those were experimentally compared. Finally, 0.045nm RMS of reproducibility was achieved with PDI method and the residual systematic error after removing specified errors was reduced to 0.064nm RMS excluding axial symmetrical aberrations. In addition, one of LSI-type methods also proved to have almost enough accuracy for the assembly of the projection optics.

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Chidane Ouchi, Seima Kato, Masanobu Hasegawa, Takayuki Hasegawa, Hideo Yokota, Katsumi Sugisaki, Masashi Okada, Katsuhiko Murakami, Jun Saito, Masahito Niibe, and Mitsuo Takeda "EUV wavefront metrology at EUVA", Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 61522O (24 March 2006); https://doi.org/10.1117/12.656039

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