An investigation of the removal of 1-Methyl-2-Pyrrolidinone (NMP)

Andrew J. Dallas; Lefei Ding; Jon Joriman; Brian Hoang; Kevin Seguin; Dustin Zastera

doi:10.1117/12.654839

24 March 2006 An investigation of the removal of 1-Methyl-2-Pyrrolidinone (NMP)

Andrew J. Dallas, Lefei Ding, Jon Joriman, Brian Hoang, Kevin Seguin, Dustin Zastera

Proceedings Volume 6152, Metrology, Inspection, and Process Control for Microlithography XX; 61523R (2006) https://doi.org/10.1117/12.654839
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

Molecular bases have long been known to be a problem in photolithographic applications using chemically amplified photoresists. Of these molecular bases, ammonia and 1-methyl-2-pyrrolidinone (NMP) have been studied in the most detail since chemical filtration of these contaminants is critical to the success of the photolithographic process. It has been well documented that ammonia is best removed through chemisorptive reactions using acid impregnated adsorbents or strong acid ion exchange resins. However, the mechanism(s) for the removal of NMP has not been investigated to any significant extent. There are several chemical filtration systems available that employ activated carbon, impregnated activated carbon, or ion exchange resins for the removal of NMP. This work investigates the removal of NMP using several different types of adsorbents and rationalizes the adsorption mechanism which is operative in each situation.

Citation Download Citation

Andrew J. Dallas, Lefei Ding, Jon Joriman, Brian Hoang, Kevin Seguin, and Dustin Zastera "An investigation of the removal of 1-Methyl-2-Pyrrolidinone (NMP)", Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 61523R (24 March 2006); https://doi.org/10.1117/12.654839

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