New measuring technique of complex index of immersion liquids

Jean-Louis Stehlé; Jean-Philippe Piel; Jose Campillo-Carreto

doi:10.1117/12.657410

24 March 2006 New measuring technique of complex index of immersion liquids

Jean-Louis Stehlé, Jean-Philippe Piel, Jose Campillo-Carreto

Proceedings Volume 6152, Metrology, Inspection, and Process Control for Microlithography XX; 615233 (2006) https://doi.org/10.1117/12.657410
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

The next nodes in immersion lithography will require to use the 193 nm laser line with very large numerical aperture and a liquid between the optics and the resist¹. Immersion lithography at 193 nm requests very specific parameters for the fluid. The first generation will use the De-Ionized Water (DIW) very pure and not recycled, but when a new optical material for last lens will be available with a refractive index (RI) larger than 1.85, a higher refractive index fluid can be used, enabling second and maybe third generation of immersion lithography at 193 nm. So the 45 and maybe the 32 nm nodes could be covered with this High Index Fluids (HIF).

Citation Download Citation

Jean-Louis Stehlé, Jean-Philippe Piel, and Jose Campillo-Carreto "New measuring technique of complex index of immersion liquids", Proc. SPIE 6152, Metrology, Inspection, and Process Control for Microlithography XX, 615233 (24 March 2006); https://doi.org/10.1117/12.657410

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