Adhesion between template materials and UV-cured nanoimprint resists

Frances A. Houle; Eric Guyer; Dolores C. Miller; Reinhold Dauskardt; Emily Rice; Jeremy Hamilton

doi:10.1117/12.655698

29 March 2006 Adhesion between template materials and UV-cured nanoimprint resists

Frances A. Houle, Eric Guyer, Dolores C. Miller, Reinhold Dauskardt, Emily Rice, Jeremy Hamilton

Proceedings Volume 6153, Advances in Resist Technology and Processing XXIII; 61531B (2006) https://doi.org/10.1117/12.655698
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

The origins of defects in lithographic stencils fabricated by the UV-cure nanoimprint technique include fundamental surface interactions between template and resist in addition to the presence of particles and contaminants. Repeated, molecularly clean separations of the template from the newly cured resist is a requirement, yet rather little is understood about the separation process or underlying interfacial physics and chemistry. We have investigated the chemical and physical interactions of several model acrylate nanoimprint resist formulations cured in contact with clean and release-treated quartz surfaces, then separated from them. The results show that fracture energies are resist formulation-dependent, that the resist-release layer systems studied are not chemically stable and that release process is more complex than simple fracture at a glass-organic interface.

Citation Download Citation

Frances A. Houle, Eric Guyer, Dolores C. Miller, Reinhold Dauskardt, Emily Rice, and Jeremy Hamilton "Adhesion between template materials and UV-cured nanoimprint resists", Proc. SPIE 6153, Advances in Resist Technology and Processing XXIII, 61531B (29 March 2006); https://doi.org/10.1117/12.655698

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