Polarization aberration analysis in optical lithography systems

Jongwook Kye; Gregory McIntyre; Yamamoto Norihiro; Harry J. Levinson

doi:10.1117/12.656864

15 March 2006 Polarization aberration analysis in optical lithography systems

Jongwook Kye, Gregory McIntyre, Yamamoto Norihiro, Harry J. Levinson

Proceedings Volume 6154, Optical Microlithography XIX; 61540E (2006) https://doi.org/10.1117/12.656864
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

The use of immersion technology extends the lifetime of optical lithography by enabling ultra-high NA much greater than 1.0. Ultra-high NA application for low k₁ imaging strongly demands an adoption of polarization illumination as a resolution enhancement technology. It is typically assumed that the transmitted wavefront has uniform amplitude and a constant polarization state across the pupil. This assumption is not valid any more for the level required for low k₁ imaging. This paper considers methods of polarization analysis including polarization aberration theory. Definitions of basic polarization phenomena and review of matrix representation are included in this discussion. Finally we propose Pauli spin matrix representation as preferred method to describe polarization aberration.

Citation Download Citation

Jongwook Kye, Gregory McIntyre, Yamamoto Norihiro, and Harry J. Levinson "Polarization aberration analysis in optical lithography systems", Proc. SPIE 6154, Optical Microlithography XIX, 61540E (15 March 2006); https://doi.org/10.1117/12.656864

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