Excimer-laser-induced photochemical polishing of SiC mirror

Masataka M. Murahara

doi:10.1117/12.461691

9 April 2002 Excimer-laser-induced photochemical polishing of SiC mirror

Masataka M. Murahara

Proceedings Volume 4679, Laser-Induced Damage in Optical Materials: 2001; (2002) https://doi.org/10.1117/12.461691
Event: Boulder Damage, 2001, Boulder, CO, United States

Abstract

SiC surface was polished accurately with KrF laser irradiation in the presence of the HF and H₂O₂ mixed solutions. The SiC is very hard; moreover, the material is resistant to chemicals. Then we tried to polish the softened SiC chemically on the soft mat. The SiC surface was pressurized at 50 g/cm² on the fluorocarbon polishing mat. Next the HF and H₂O₂ mixed solutions are infiltrated into the thin gap between the sample and the fluorocarbon, and KrF laser irradiated through the fluorocarbon turntable. By this irradiation, the SiC surface was oxidized and produced SiO₂ and CO₂. Then CO₂ is diffused in an atmosphere, and only SiO₂ solidified on the sample surface. The moment the SiO₂ was formed, it dissolves in HF solution. After the etching, the polishing progresses by the friction with the fluorocarbon. The surface roughness was obtained 80 nm with 60 minute polishing with KrF laser irradiation (400 mJ/cm², 20 pps) in 15% HF/H₂O₂ ambience.

Citation Download Citation

Masataka M. Murahara "Excimer-laser-induced photochemical polishing of SiC mirror", Proc. SPIE 4679, Laser-Induced Damage in Optical Materials: 2001, (9 April 2002); https://doi.org/10.1117/12.461691

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