Parallel-coupled dual racetrack micro-resonator structures have potential applications for quadrature amplitude modulation. Fabrication of parallel-coupled dual racetrack silicon micro-resonators was conducted, while overcoming for some barriers to fabrication. Fabrication process limitations and design considerations are discussed. Fabrication results are presented. Some barriers to fabrication include stitching and overdosing in electron beam lithography. A multi-input and output test bed with optical and electrical control was necessary for device characterization. The characterization of the fabricated devices is presented, along with the related procedures. Some of the tests performed are wavelength scans and top surface scans.© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.