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Proceedings Article

Fabrication and characterization of parallel-coupled dual racetrack silicon microresonators

[+] Author Affiliations
Ryan A. Integlia, Lianghong Yin, Weiwei Song, Wei Jiang

Rutgers, The State Univ. of New Jersey (USA)

Duo Ding, David Z. Pan

The Univ. of Texas at Austin (USA)

Douglas M. Gill

Alcatel-Lucent Bell Labs. (USA)

Ying Qian

Rutgers, The State Univ. of New Jersey (USA) and Jilin Univ. (China)

Proc. SPIE 8266, Silicon Photonics VII, 82660M (February 9, 2012); doi:10.1117/12.908601
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From Conference Volume 8266

  • Silicon Photonics VII
  • Joel Kubby; Graham T. Reed
  • San Francisco, California, USA | January 21, 2012

abstract

Parallel-coupled dual racetrack micro-resonator structures have potential applications for quadrature amplitude modulation. Fabrication of parallel-coupled dual racetrack silicon micro-resonators was conducted, while overcoming for some barriers to fabrication. Fabrication process limitations and design considerations are discussed. Fabrication results are presented. Some barriers to fabrication include stitching and overdosing in electron beam lithography. A multi-input and output test bed with optical and electrical control was necessary for device characterization. The characterization of the fabricated devices is presented, along with the related procedures. Some of the tests performed are wavelength scans and top surface scans.

© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Citation

Ryan A. Integlia ; Lianghong Yin ; Duo Ding ; David Z. Pan ; Douglas M. Gill, et al.
"Fabrication and characterization of parallel-coupled dual racetrack silicon microresonators", Proc. SPIE 8266, Silicon Photonics VII, 82660M (February 9, 2012); doi:10.1117/12.908601; http://dx.doi.org/10.1117/12.908601


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