Electrochemical investigation of the stability and corrosion resistance of boron phosphide films prepared by PECVD

Abraham Ogwu; Thomas Hellwig; Saul Doherty; David Haddow; Klaus-Peter Moellman; Francis Placido

doi:10.1117/12.603337

18 May 2005 Electrochemical investigation of the stability and corrosion resistance of boron phosphide films prepared by PECVD

Abraham Ogwu, Thomas Hellwig, Saul Doherty, David Haddow, Klaus-Peter Moellman, Francis Placido

Author Affiliations +

Proceedings Volume 5786, Window and Dome Technologies and Materials IX; (2005) https://doi.org/10.1117/12.603337
Event: Defense and Security, 2005, Orlando, Florida, United States

Abstract

The corrosion susceptibility of Boron phosphide films prepared by PECVD, was studied in saturated saline solution as a function of phosphine flow rate during deposition. The chemical composition of the Boron phosphide films was determined by x-ray photoelectron spectroscopy (XPS) analysis. The investigation involved open circuit potential measurements (OCP) over several hours, potentiodynamic polarisation and electrochemical impedance Spectroscopy (EIS) measurements. The corrosion rate of the Boron Phosphide films was found to vary with changes in the phosphine flow rate during deposition. The results of our investigation also showed that Boron phosphide coated stainless steel plates had superior corrosion resistance, when compared to bare uncoated stainless steel plates. This opens up the potential for the application of Boron Phosphide films as a protective coating to improve the corrosion resistance of metals and alloys for various engineering applications.

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Abraham Ogwu, Thomas Hellwig, Saul Doherty, David Haddow, Klaus-Peter Moellman, and Francis Placido "Electrochemical investigation of the stability and corrosion resistance of boron phosphide films prepared by PECVD", Proc. SPIE 5786, Window and Dome Technologies and Materials IX, (18 May 2005); https://doi.org/10.1117/12.603337

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