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Proceedings Article

Inverse Lithography Technology (ILT): what is the impact to the photomask industry?

[+] Author Affiliations
Linyong Pang, Yong Liu, Dan Abrams

Luminescent Technologies, Inc.

Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 62830X (May 20, 2006); doi:10.1117/12.681857
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From Conference Volume 6283

  • Photomask and Next-Generation Lithography Mask Technology XIII
  • Morihisa Hoga
  • Yokohama, Japan | April 18, 2006

abstract

Inverse Lithography Technology (ILT) is a rigorous approach to determine the mask shapes that produce the desired on-wafer results. In this paper, we briefly describe an image (or pixel))-based implementation of ILT in comparison to OPC technologies, which are usually edge-based. Such implementation is more computationally scalable and avoids laborious segmentation script-writing, which becomes more complex for newer generations because of complicated proximity effects. In this paper, we will give an overview of ILT, present some simulation and wafer examples to demonstrate the benefit of ILT, clarify common myths about ILT, discuss and show examples to illustrate the impact in every step of the mask making process. Specifically, studies done with several leading mask shops around the world on mask manufacturability (including data fracturing, writing strategy and writing time, mask inspection), will be shown.

© (2006) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Linyong Pang ; Yong Liu and Dan Abrams
"Inverse Lithography Technology (ILT): what is the impact to the photomask industry?", Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 62830X (May 20, 2006); doi:10.1117/12.681857; http://dx.doi.org/10.1117/12.681857


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