High-power DPL thin films prepared by ion beam sputtering

Hongxiang Liu; Shengming Xiong; Yundong Zhang

doi:10.1117/12.675254

28 August 2006 High-power DPL thin films prepared by ion beam sputtering

Hongxiang Liu, Shengming Xiong, Yundong Zhang

Proceedings Volume 6286, Advances in Thin-Film Coatings for Optical Applications III; 628605 (2006) https://doi.org/10.1117/12.675254
Event: SPIE Optics + Photonics, 2006, San Diego, California, United States

Abstract

Ion beam sputtering enables high laser damage threshold mirrors to be manufactured. Oxygen partial pressure was found to have significant influence on the microstructure and optical properties of HfO₂ thin films deposited by ion beam sputtering (IBS). Atomic force microscopy studies have shown that the surface of single HfO₂ films is clearly characterized by deep holes. When oxygen is excessive, the RMS roughness of the surface increases with the presence of the holes, and the transmittance of the single HfO₂ layers reduces evidently in the shortwave spectral region. The laser-induced damage threshold (LIDT) of HfO₂/SiO₂ multilayer stacks was investigated with a diode pump laser at 1064 nm under a certain repetition frequency. The laser-induced damage morphology of DPL thin films were observed by the optical microscope. SiO₂ overcoats increase the damage threshold and modify the damage morphology of IBS coatings. The LIDT of the cavity mirrors is > 1 GW/cm² at 1064 nm (80 ns, 10 KHz).

Citation Download Citation

Hongxiang Liu, Shengming Xiong, and Yundong Zhang "High-power DPL thin films prepared by ion beam sputtering", Proc. SPIE 6286, Advances in Thin-Film Coatings for Optical Applications III, 628605 (28 August 2006); https://doi.org/10.1117/12.675254

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