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Proceedings Article

Graded multilayers for focusing hard x-rays below 50 nm

[+] Author Affiliations
Ch. Morawe, O. Hignette, P. Cloetens, W. Ludwig, Ch. Borel, P. Bernard, A. Rommeveaux

European Synchrotron Radiation Facility (France)

Proc. SPIE 6317, Advances in X-Ray/EUV Optics, Components, and Applications, 63170F (August 29, 2006); doi:10.1117/12.679039
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From Conference Volume 6317

  • Advances in X-Ray/EUV Optics, Components, and Applications
  • Ali M. Khounsary; Christian Morawe
  • San Diego, California, USA | August 13, 2006

abstract

Laterally graded W/B4C multilayers were conceived for the focusing of hard X rays at 3rd generation synchrotron sources. They were deposited using a differential sputter coating technique. The multilayer mirror was bent to the correct shape on a dynamical bending device applying automated alignment routines. During experiments on the ESRF beamline ID19 the undulator source was focused vertically to a 41 nm (FWHM) wide line using a photon energy of 24 keV. The measured line width can be attributed to the finite source size, to diffraction effects, and to slope errors of the mirror. The potential impact of beam penetration into the multilayer will be discussed.

© (2006) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Ch. Morawe ; O. Hignette ; P. Cloetens ; W. Ludwig ; Ch. Borel, et al.
"Graded multilayers for focusing hard x-rays below 50 nm", Proc. SPIE 6317, Advances in X-Ray/EUV Optics, Components, and Applications, 63170F (August 29, 2006); doi:10.1117/12.679039; http://dx.doi.org/10.1117/12.679039


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