Graded multilayers for focusing hard x-rays below 50 nm

Ch. Morawe; O. Hignette; P. Cloetens; W. Ludwig; Ch. Borel; P. Bernard; A. Rommeveaux

doi:10.1117/12.679039

29 August 2006 Graded multilayers for focusing hard x-rays below 50 nm

Ch. Morawe, O. Hignette, P. Cloetens, W. Ludwig, Ch. Borel, P. Bernard, A. Rommeveaux

Proceedings Volume 6317, Advances in X-Ray/EUV Optics, Components, and Applications; 63170F (2006) https://doi.org/10.1117/12.679039
Event: SPIE Optics + Photonics, 2006, San Diego, California, United States

Abstract

Laterally graded W/B₄C multilayers were conceived for the focusing of hard X rays at 3^rd generation synchrotron sources. They were deposited using a differential sputter coating technique. The multilayer mirror was bent to the correct shape on a dynamical bending device applying automated alignment routines. During experiments on the ESRF beamline ID19 the undulator source was focused vertically to a 41 nm (FWHM) wide line using a photon energy of 24 keV. The measured line width can be attributed to the finite source size, to diffraction effects, and to slope errors of the mirror. The potential impact of beam penetration into the multilayer will be discussed.

Citation Download Citation

Ch. Morawe, O. Hignette, P. Cloetens, W. Ludwig, Ch. Borel, P. Bernard, and A. Rommeveaux "Graded multilayers for focusing hard x-rays below 50 nm", Proc. SPIE 6317, Advances in X-Ray/EUV Optics, Components, and Applications, 63170F (29 August 2006); https://doi.org/10.1117/12.679039

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