Reflectivity and stress responses of multilayers upon isothermal treatment

C. Borel; C. Morawe; A. Rommeveaux; C. Huguenot; J.-C. Peffen

doi:10.1117/12.678472

11 September 2006 Reflectivity and stress responses of multilayers upon isothermal treatment

C. Borel, C. Morawe, A. Rommeveaux, C. Huguenot, J.-C. Peffen

Proceedings Volume 6317, Advances in X-Ray/EUV Optics, Components, and Applications; 63170I (2006) https://doi.org/10.1117/12.678472
Event: SPIE Optics + Photonics, 2006, San Diego, California, United States

Abstract

Periodic multilayers exposed to a non-destructive annealing sequence have shown reversible and irreversible structural modifications. In-situ x-ray reflectometry experiments at the ESRF bending magnet beam line BM5 demonstrate that the overall periodic structure remains stable during the annealing process. At the same time, initially present asymmetric interdiffusion layers have been reduced, in particular, in Ru/B₄C. The controlled thermal treatment of multilayer optics before its installation on synchrotron beam lines can help to avoid alterations during their use as optical elements. An important issue is the reduction of stress introduced during the coating process. The evolution of stress in multilayer test coatings deposited on wafers was worked out from measurements done by optical metrology before and after coating and annealing. The investigation of the influence of a thermal action on their reflectivity response is a real challenge. We will present our experimental approach: deposition technique, multilayer choice, isothermal sequence, reflectivity and stress measurements. We will also discuss compromises made to keep both reflectivity and stress optimized versus thermal treatment. Future studies will have to deal with the impact of radiation on multilayer optics and its distinction from annealing effects.

Citation Download Citation

C. Borel, C. Morawe, A. Rommeveaux, C. Huguenot, and J.-C. Peffen "Reflectivity and stress responses of multilayers upon isothermal treatment", Proc. SPIE 6317, Advances in X-Ray/EUV Optics, Components, and Applications, 63170I (11 September 2006); https://doi.org/10.1117/12.678472

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