Nanostructure of GdF3 thin film evaluated by variable angle spectroscopic ellipsometry

Jue Wang; Robert Maier; Paul G. Dewa; Horst Schreiber; Robert A. Bellman; David Dawson Elli

doi:10.1117/12.677538

14 September 2006 Nanostructure of GdF₃ thin film evaluated by variable angle spectroscopic ellipsometry

Jue Wang, Robert Maier, Paul G. Dewa, Horst Schreiber, Robert A. Bellman, David Dawson Elli

Proceedings Volume 6321, Nanophotonic Materials III; 632107 (2006) https://doi.org/10.1117/12.677538
Event: SPIE Optics + Photonics, 2006, San Diego, California, United States

Abstract

As excimer lasers extend to deep-ultraviolet and vacuum-ultraviolet wavelengths at 193nm and 157nm, optical coatings experience the challenge of eliminating possible environmental contamination, reducing scattering loss, and increasing laser irradiation durability. Wide band-gap metal fluorides become the materials of choice for the laser optics applications. In order to understand the optical properties of nanostructured fluoride films, thin GdF₃ films grown on CaF₂ (111) substrates were evaluated by variable angle spectroscopic ellipsometry. An effective medium approximation model was used to determine both the film porosity and the surface roughness. Structural evolution of the GdF₃ film was revealed with improved ellipsometric modeling, suggesting the existence of 3-layer structure, a densified bottom layer, a porous middle layer and a rough top surface. The nanostructure of the film and the surface roughness were confirmed by atomic force microscopy. The attraction of the nano-structure to environmental contamination was experimentally demonstrated.

Citation Download Citation

Jue Wang, Robert Maier, Paul G. Dewa, Horst Schreiber, Robert A. Bellman, and David Dawson Elli "Nanostructure of GdF₃ thin film evaluated by variable angle spectroscopic ellipsometry", Proc. SPIE 6321, Nanophotonic Materials III, 632107 (14 September 2006); https://doi.org/10.1117/12.677538

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