Paper
21 July 2006 Aberration functions for microlithographic lens
Tomoyuki Matsuyama, Tomoko Ujike
Author Affiliations +
Proceedings Volume 6342, International Optical Design Conference 2006; 63422D (2006) https://doi.org/10.1117/12.692226
Event: International Optical Design Conference 2006, 2006, Vancouver, BC, Canada
Abstract
We proposed a series of orthogonal aberration functions, which is suitable for a microlithographic projection lens. In this paper, general explanation and numbering of the orthogonal aberration functions are reviewed.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tomoyuki Matsuyama and Tomoko Ujike "Aberration functions for microlithographic lens", Proc. SPIE 6342, International Optical Design Conference 2006, 63422D (21 July 2006); https://doi.org/10.1117/12.692226
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KEYWORDS
Manufacturing

Optics manufacturing

Wavefront aberrations

Lens manufacturing

Wavefronts

Lens design

Lithography

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