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Proceedings Article

Recent trends in white-light interferometry

[+] Author Affiliations
Katsuichi Kitagawa

Toray Engineering Co., Ltd. (Japan)

Proc. SPIE 6382, Two- and Three-Dimensional Methods for Inspection and Metrology IV, 638201 (October 12, 2006); doi:10.1117/12.693634
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From Conference Volume 6382

  • Two- and Three-Dimensional Methods for Inspection and Metrology IV
  • Peisen S. Huang
  • Boston, MA | October 01, 2006

abstract

The technique of surface profile measurement utilizing white-light interferometry is widely used in industry. However, it has certain shortcomings, such as slow measurement speed and the possibility of error caused by a transparent film on the surface. This paper introduces four of our recent developments in white-light interferometry: 1) speed improvement by sub-Nyquist sampling, 2) accuracy improvement through the use of phase information, 3) profiling of a thick transparent film, and 4) profiling of a thin transparent film.

© (2006) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

Katsuichi Kitagawa
"Recent trends in white-light interferometry", Proc. SPIE 6382, Two- and Three-Dimensional Methods for Inspection and Metrology IV, 638201 (October 12, 2006); doi:10.1117/12.693634; http://dx.doi.org/10.1117/12.693634


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