Paper
22 March 2007 Atomic hydrogen cleaning of Ru-capped EUV multilayer mirror
Kumi Motai, Hiroaki Oizumi, Shinji Miyagaki, I. Nishiyama, Akira Izumi, Tomoya Ueno, Yasuo Miyazaki, Akira Namiki
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Abstract
Atomic hydrogen cleaning has been developed to reduce the amount of surface oxide on Ru-capped Mo/Si multilayer mirrors for EUVL. Atomic hydrogen generated by a heated W wire catalyzer was supplied to a Ru cap layer that had been lightly oxidized by ECR O2 plasma or EUV irradiation. The effectiveness of atomic hydrogen in deoxidizing it was examined by ex situ AES, XPS, and EUV absolute reflectivity measurements; and it was found that the amount of surface oxide was reduced to the initial level and that the EUV reflectivity of a multilayer degraded by oxidation recovered. In addition, the transport of atomic hydrogen thorough a winding quartz tube was demonstrated to be a promising technique. The actual density of hydrogen radicals was directly measured under various conditions so that the conditions for generating atomic hydrogen could be optimized and the required treatment time shortened.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kumi Motai, Hiroaki Oizumi, Shinji Miyagaki, I. Nishiyama, Akira Izumi, Tomoya Ueno, Yasuo Miyazaki, and Akira Namiki "Atomic hydrogen cleaning of Ru-capped EUV multilayer mirror", Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65170F (22 March 2007); https://doi.org/10.1117/12.711998
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Cited by 9 scholarly publications and 1 patent.
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KEYWORDS
Hydrogen

Ruthenium

Extreme ultraviolet

Reflectivity

Oxides

Mirrors

Plasma

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