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Proceedings Article

Enhanced reflectance of interface engineered Mo/Si multilayers produced by thermal particle deposition

[+] Author Affiliations
A. E. Yakshin, R. W. E. van de Kruijs, I. Nedelcu, E. Zoethout, E. Louis, F. Bijkerk

FOM Institute for Plasma Physics Rijnhuizen (Netherlands)

H. Enkisch, S. Müllender

Carl Zeiss SMT AG (Germany)

Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65170I (March 15, 2007); doi:10.1117/12.711796
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From Conference Volume 6517

  • Emerging Lithographic Technologies XI
  • Michael J. Lercel
  • San Jose, CA | February 25, 2007

abstract

A new deposition technique that builds on the thermal particle characteristics typical for e-beam deposition is described. This technique applies magnetron sputtering in a special scheme where these characteristics of the e-beam deposition method are achieved. The method was used for interface engineering of Mo/Si multilayers, with different barrier layer materials being tested. Composition of the barrier layers formed was studied using XPS. Results are shown on the general example of a Mo/B4C/Si/B4C system. The ultra-thin reflectance enhancement B4C barriers can be deposited with low added stress, resulting in a multilayer stress as low as about -150 MPa. The best interface engineered multilayers reflect 70.5% at 13.3 nm and 70.15% at 13.5 nm. These results were achieved with 50 period multilayers terminated with a standard Si layer.

© (2007) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

A. E. Yakshin ; R. W. E. van de Kruijs ; I. Nedelcu ; E. Zoethout ; E. Louis, et al.
"Enhanced reflectance of interface engineered Mo/Si multilayers produced by thermal particle deposition", Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65170I (March 15, 2007); doi:10.1117/12.711796; http://dx.doi.org/10.1117/12.711796


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