Full Content is available to subscribers

Subscribe/Learn More  >
Proceedings Article

Extreme ultraviolet interference lithography with incoherent light

[+] Author Affiliations
Patrick P. Naulleau

Lawrence Berkeley National Lab.

Christopher N. Anderson

Univ. of California, Berkeley

Stephen F. Horne

Energetiq Technology Inc.

Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65172T (March 21, 2007); doi:10.1117/12.715069
Text Size: A A A
From Conference Volume 6517

  • Emerging Lithographic Technologies XI
  • Michael J. Lercel
  • San Jose, CA | February 25, 2007


In order to address the crucial problem of high-resolution low line-edge roughness resist for extreme ultraviolet (EUV) lithography, researchers require significant levels of access to high-resolution EUV exposure tools. The prohibitively high cost of such tools, even microfield tools, has greatly limited this availability and arguably hindered progress in the area of EUV resists. To address this problem, we propose the development of a new interference lithography tool capable of working with standalone incoherent EUV sources. Although EUV interference lithography tools are currently in operation, presently used designs require illumination with a high degree of spatial and/or temporal coherence. This, in practice, limits current systems to being implemented at synchrotron facilities greatly restricting the accessibility of such systems. Here we describe an EUV interference lithography system design capable of overcoming the coherence limitations, allowing standalone high-power broad sources to be used without the need for excessive spatial or temporal filtering. Such a system provides promising pathway for the commercialization of EUV interference lithography tools.

© (2007) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.

Patrick P. Naulleau ; Christopher N. Anderson and Stephen F. Horne
"Extreme ultraviolet interference lithography with incoherent light", Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65172T (March 21, 2007); doi:10.1117/12.715069; http://dx.doi.org/10.1117/12.715069

Access This Article
Sign In to Access Full Content
Please Wait... Processing your request... Please Wait.
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).



Citing articles are presented as examples only. In non-demo SCM6 implementation, integration with CrossRef’s "Cited By" API will populate this tab (http://www.crossref.org/citedby.html).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Journal Articles

Related Book Chapters

Topic Collections


Buy this article ($18 for members, $25 for non-members).
Sign In