Sub-nanometer CD-SEM matching

Travis Lott; Russell J. Elias

doi:10.1117/12.712213

5 April 2007 Sub-nanometer CD-SEM matching

Travis Lott, Russell J. Elias

Proceedings Volume 6518, Metrology, Inspection, and Process Control for Microlithography XXI; 651838 (2007) https://doi.org/10.1117/12.712213
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

Reducing metrology fleet variation through improved matching techniques is a never-ending journey. In exceeding vendor specifications, CD-SEM matching of < 1nm were demonstrated between two tools. Details and methods are discussed, including FOV Factor matching, automated SEM tuning, new qual sampling plans (termed 5x5x5), and a 1st difference monitoring plan for tool drift. The results obtained in this paper were collected over a year and included data before and after maintenance events (ie. Tip changes.)

Citation Download Citation

Travis Lott and Russell J. Elias "Sub-nanometer CD-SEM matching", Proc. SPIE 6518, Metrology, Inspection, and Process Control for Microlithography XXI, 651838 (5 April 2007); https://doi.org/10.1117/12.712213

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