Specular and diffuse reflectance of silicon photodiodes

Yingchun Zhou; Tao Xu; Huaping Chen

doi:10.1117/12.783150

17 January 2008 Specular and diffuse reflectance of silicon photodiodes

Yingchun Zhou, Tao Xu, Huaping Chen

Proceedings Volume 6723, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment; 67231B (2008) https://doi.org/10.1117/12.783150
Event: 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Large Mirrors and Telescopes, 2007, Chengdu, China

Abstract

Now spectral reflectance of silicon photodiodes is described as the reflectance based on thin-film Fresnel formulas and the known refractive indices of the materials of photodiodes. In this paper the diffuse reflectance of light in Si materials is considered. A precision spectrometer is developed to measure the specular and diffuse reflectance of a silicon photodiode over the wavelength range from 400 to 900 nm. The results are compared with the corresponding values predicted by Fresnel model and diffuse model. It is found that the predicted values by Fresnel model show agreement with experimental values of specular reflectance. The diffuse model can predict both specular reflectance and diffuse reflectance well. This result can be used in auto-calibration technology for photodiode spectral response metrology.

Citation Download Citation

Yingchun Zhou, Tao Xu, and Huaping Chen "Specular and diffuse reflectance of silicon photodiodes", Proc. SPIE 6723, 3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 67231B (17 January 2008); https://doi.org/10.1117/12.783150

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