Key parameters of EUV resists for contact hole applications

Kyoungyong Cho; Hiroki Nakagawa; Ken Maruyama; Makoto Shimizu; Tooru Kimura; Yoshi Hishiro

doi:10.1117/12.916837

23 March 2012 Key parameters of EUV resists for contact hole applications

Kyoungyong Cho, Hiroki Nakagawa, Ken Maruyama, Makoto Shimizu, Tooru Kimura, Yoshi Hishiro

Proceedings Volume 8322, Extreme Ultraviolet (EUV) Lithography III; 83221B (2012) https://doi.org/10.1117/12.916837
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

Patterning contact hole (CH) features with good critical dimension uniformity (CDU) is one of the most critical challenges for 10nm node lithography and beyond. Extreme ultraviolet lithography (EUVL) is considered a potential candidate because of its better aerial imaging and larger k1 factor than ArF immersion. To apply EUV lithography to high volume manufacturing, EUV resists must overcome both the trade-off among resolution (R), local CD uniformity (LCDU), and sensitivity (S) at CH features and the RLS trade-off at line/space (LS) features. We evaluated various resist materials for CH patterning applications using the microexposure tools (METs) at SEMATECH in Albany, NY, and at Lawrence Berkeley National Laboratory. In this study, we report the correlation between the lithographic performance of EUV resist at CH features and physical properties of chemically amplified resists (CARs) such as their dissolution behavior, the activation energy level of the protective group, and the acidity/acid diffusion length of the photoacid generator (PAG).

Citation Download Citation

Kyoungyong Cho, Hiroki Nakagawa, Ken Maruyama, Makoto Shimizu, Tooru Kimura, and Yoshi Hishiro "Key parameters of EUV resists for contact hole applications", Proc. SPIE 8322, Extreme Ultraviolet (EUV) Lithography III, 83221B (23 March 2012); https://doi.org/10.1117/12.916837

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available