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Proceedings Article

Optical performance of LPP multilayer collector mirrors

[+] Author Affiliations
Torsten Feigl, Marco Perske, Hagen Pauer, Tobias Fiedler, Sergiy Yulin, Marcus Trost, Sven Schröder, Angela Duparré, Norbert Kaiser, Andreas Tünnermann

Fraunhofer Institute for Applied Optics and Precision Engineering (Germany)

Norbert R. Böwering, Alex I. Ershov, Kay Hoffmann, Bruno La Fontaine, Kevin D. Cummings

Cymer, Inc. (United States)

Proc. SPIE 8322, Extreme Ultraviolet (EUV) Lithography III, 832217 (March 29, 2012); doi:10.1117/12.919735
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From Conference Volume 8322

  • Extreme Ultraviolet (EUV) Lithography III
  • Patrick P. Naulleau; Obert R. Wood II
  • San Jose, California | February 12, 2012


The usable power and the collector optics lifetime of high-power extreme ultraviolet light sources at 13.5 nm are considered as the major challenges in the transitioning of EUV lithography from the current pre-production phase to high volume manufacturing. We give a detailed performance summary of the large ellipsoidal multilayer collector mirrors used in Cymer's laser-produced plasma extreme ultraviolet light sources. In this paper we present the optical performance - reflectance and wavelength - of the multilayer-coated ellipsoidal collectors as well as a novel approach for the roughness characterization of large EUV mirror optics based on light scattering measurements at 442 nm. We also describe the optical performance and characteristics during operation of the light source and the substantial increase of collector lifetime by the implementation of new coating designs.

© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.

Torsten Feigl ; Marco Perske ; Hagen Pauer ; Tobias Fiedler ; Sergiy Yulin, et al.
"Optical performance of LPP multilayer collector mirrors", Proc. SPIE 8322, Extreme Ultraviolet (EUV) Lithography III, 832217 (March 29, 2012); doi:10.1117/12.919735; http://dx.doi.org/10.1117/12.919735

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