The usable power and the collector optics lifetime of high-power extreme ultraviolet light sources at 13.5 nm are
considered as the major challenges in the transitioning of EUV lithography from the current pre-production phase to
high volume manufacturing. We give a detailed performance summary of the large ellipsoidal multilayer collector
mirrors used in Cymer's laser-produced plasma extreme ultraviolet light sources. In this paper we present the optical
performance - reflectance and wavelength - of the multilayer-coated ellipsoidal collectors as well as a novel approach
for the roughness characterization of large EUV mirror optics based on light scattering measurements at 442 nm. We
also describe the optical performance and characteristics during operation of the light source and the substantial increase
of collector lifetime by the implementation of new coating designs.© (2012) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.