Paper
4 December 1998 Toward quantum dot laser diodes emitting at 1.5 μm
Simon Fafard, John P. McCaffrey, Yan Feng, C. Ni. Allen, Hugues Marchand, L. Isnard, Patrick Desjardins, S. Guillon, Remo A. Masut
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Abstract
Quantum Dot laser diodes have been made using InAs self- assembled quantum dots (QDs) in the active region of separate confinement heterostructures. The lasers grown by Molecular Beam Epitaxy (MBE) with stacked InAs QDs grown on GaAs gave record low thresholds of 13 A/cm2 at 77 K and 82 A/cm2 at 15 degree(s)C. On InP substrates, InAs QDs have been grown by Metal-Organic Chemical Vapor Deposition (MOCVD) with InP claddings, and by MBE in InGaAlAs separate confinement heterostructures. For the InAs/InP by MOCVD, the QD photoluminescence (PL) peaks between 1.51 micrometers and 1.57 micrometers at 77 K and close to 1.6 micrometers at 300 K. Transmission Electron Microscope analysis correlated with the PL results reveal that the QD density depends on the growth interrupt time which follows the InAs deposition. For the InAs/InGaAlAs by MBE, the QD electroluminescence peaks at approximately 1.42 micrometers at 300 K.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Simon Fafard, John P. McCaffrey, Yan Feng, C. Ni. Allen, Hugues Marchand, L. Isnard, Patrick Desjardins, S. Guillon, and Remo A. Masut "Toward quantum dot laser diodes emitting at 1.5 μm", Proc. SPIE 3491, 1998 International Conference on Applications of Photonic Technology III: Closing the Gap between Theory, Development, and Applications, (4 December 1998); https://doi.org/10.1117/12.328737
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Cited by 5 scholarly publications.
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KEYWORDS
Indium arsenide

Electroluminescence

Heterojunctions

Laser damage threshold

Diodes

Gallium arsenide

Quantum dot lasers

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