Paper
1 November 1991 In-situ laser preparation of high-Tc superconducting thin film at 450°-550° C
Chengwu An, Yongchang Fan, Dongsheng Lu, Zaiguang Li
Author Affiliations +
Proceedings Volume 1519, International Conference on Thin Film Physics and Applications; (1991) https://doi.org/10.1117/12.47265
Event: International Conference on Thin Film Physics and Applications, 1991, Shanghai, China
Abstract
Superconducting thin films of Y-Ba-Cu-O on zirconia substrate are prepared using excimer laser (308 nm, 28 ns) ablation of a superconducting Y-Ba-Cu oxide disk without plasma assistance in the substrate temperature range from 450 - 550 degree(s)C. The high or low- temperature post-annealing in an oxygen atmosphere is not necessary. The highest zero resistance temperature of the produced film is up to 91.5 K. X-ray diffraction spectra reveal that the thin films are preferential x-axis orientation normal to the surface. The key to the success is increasing the oxygen pressure in the deposition chamber to about 220 mTorr and making the ejected oxygen interact with the laser beam before it comes to the deposition area. The influences of the oxygen pressure ejected into the chamber, of the laser flux density and of the substrate temperature on the superconducting property of the produced thin films are discussed.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Chengwu An, Yongchang Fan, Dongsheng Lu, and Zaiguang Li "In-situ laser preparation of high-Tc superconducting thin film at 450°-550° C", Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); https://doi.org/10.1117/12.47265
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KEYWORDS
Oxygen

Superconductors

Thin films

Resistance

Laser ablation

Technetium

Temperature metrology

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