The saga of lambda: spectral influences throughout lithography generations

Bruce W. Smith

doi:10.1117/12.920025

20 March 2012 The saga of lambda: spectral influences throughout lithography generations

Bruce W. Smith

Proceedings Volume 8325, Advances in Resist Materials and Processing Technology XXIX; 83250Z (2012) https://doi.org/10.1117/12.920025
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

In this paper, the progression of optical lithography from a spectral (or wavelength) perspective is presented. The interdependencies between materials, sources, design challenges, and scaling are described relative the needs of semiconductor device generations. Comparisons of materials and approaches for use in the blue-UV, the mid-UV, the deep-UV, and to EUV wavelengths are provided showing the spectral influences for choices made. Inorganic and organic lithography materials, sources of radiation, and incremental wavelength "shrink" are compared for lithography generations from g-line to EUV and beyond.

Citation Download Citation

Bruce W. Smith "The saga of lambda: spectral influences throughout lithography generations", Proc. SPIE 8325, Advances in Resist Materials and Processing Technology XXIX, 83250Z (20 March 2012); https://doi.org/10.1117/12.920025

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