Defining and measuring development rates for a stochastic resist

Chris A. Mack

doi:10.1117/12.916195

20 March 2012 Defining and measuring development rates for a stochastic resist

Chris A. Mack

Proceedings Volume 8325, Advances in Resist Materials and Processing Technology XXIX; 83251K (2012) https://doi.org/10.1117/12.916195
Event: SPIE Advanced Lithography, 2012, San Jose, California, United States

Abstract

Development rate can be defined microscopically (the development rate at a point) or macroscopically (the propagation rate of an average resist height). In the presence of stochastic noise, these two rates will be different. Using a stochastic resist simulator, the propagation rate of a resist surface is calculated in the presence of stochastic variation in the resist deprotection concentration using a nonlinear development rate model. For both 2D and 3D simulations, the development front propagation rate was fit to semi-empirical expressions. The resulting propagation rate can be more than an order of magnitude higher than for the case of no stochastic noise. The differences between microscopic and macroscopic dissolution rate can have an important effect on how development rate models should be calibrated, depending on their use in continuum or stochastic lithography simulators.

Citation Download Citation

Chris A. Mack "Defining and measuring development rates for a stochastic resist", Proc. SPIE 8325, Advances in Resist Materials and Processing Technology XXIX, 83251K (20 March 2012); https://doi.org/10.1117/12.916195

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