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Proceedings Article

Application of spectroscopic ellipsometry to characterization of optical thin films

[+] Author Affiliations
John A. Woollam

J. A. Woollam Co., Inc. (USA) and Univ. of Nebraska/Lincoln (USA)

Corey L. Bungay, James N. Hilfiker

J. A. Woollam Co., Inc. (USA)

Li Yan, Daniel W. Thompson

Univ. of Nebraska, Lincoln (USA)

Proc. SPIE 4932, Laser-Induced Damage in Optical Materials: 2002 and 7th International Workshop on Laser Beam and Optics Characterization, 393 (May 28, 2003); doi:10.1117/12.474854
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From Conference Volume 4932

  • Laser-Induced Damage in Optical Materials: 2002 and 7th International Workshop on Laser Beam and Optics Characterization
  • Gregory J. Exarhos; Arthur H. Guenther; Norbert Kaiser; Keith L. Lewis; M. J. Soileau; Christopher J. Stolz; Adolf Giesen; Horst Weber
  • Boulder, CO | September 16, 2002

abstract

Spectroscopic ellipsometry is used to determine optical constants, layer thicknesses in multilayer stacks, and microstructure (voids, alloy fraction, or mixed phase composition), and is a well-developed technique for analysis of optical thin films. Ellipsometers now cover from 140 nm (≈ 9 eV) in the vacuum-ultraviolet to 200 microns (50cm-1) in the far infrared. Generalized anisotropy and depolarization are measurable using rotating compensator ellipsometers or controlled retarders for partial Mueller Matrix analysis. Rotating compensator ellipsometers allow accurate and rapid in situ diagnostics, including window birefringence calibration. Steady progress has been made in both ex situ and in situ ellipsometry hardware, software, and applications. These advances are reviewed and examples given.

© (2003) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
Citation

John A. Woollam ; Corey L. Bungay ; Li Yan ; Daniel W. Thompson and James N. Hilfiker
"Application of spectroscopic ellipsometry to characterization of optical thin films", Proc. SPIE 4932, Laser-Induced Damage in Optical Materials: 2002 and 7th International Workshop on Laser Beam and Optics Characterization, 393 (May 28, 2003); doi:10.1117/12.474854; http://dx.doi.org/10.1117/12.474854


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