Resolution enhancement of 157-nm lithography by liquid immersion

Michael Switkes; Mordechai Rothschild

doi:10.1117/12.474568

30 July 2002 Resolution enhancement of 157-nm lithography by liquid immersion

Proceedings Volume 4691, Optical Microlithography XV; (2002) https://doi.org/10.1117/12.474568
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

We present the results of a preliminary feasibility study of liquid immersion lithography at 157 nm. A key enabler has been the identification of a class of commercially available liquids, perfluoropolyethers, with low 157 nm absorbance α₁₅₇~10 cm-1 base10. With 157 nm index of refraction around 1.36, these liquids could enable lithography at NA~1.25 and thus resolution of 50 nm for k1=0.4. We have also performed preliminary studies on the optical, chemical, and physical suitability of these liquids for use in high throughput lithography. We also note that at longer wavelengths, there is a wider selection of transparent immersion liquids. At 193 nm, the most transparent liquid measured, deionized water, has α₁₉₃ = 0.036 cm-1 base 10. Water immersion lithography at 193 nm would enable resolution of 60 nm with k1=0.4.

Citation Download Citation

Michael Switkes and Mordechai Rothschild "Resolution enhancement of 157-nm lithography by liquid immersion", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); https://doi.org/10.1117/12.474568

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